- Reactivity of Different Nitriding Agents with Chlorine- terminated Surface During Atomic Layer Deposition of Silicon Nitride
Tirta Rona Mayangsari, Luchana Lamierza Yusup, Romel Hidayat, Tanzia Chowdhury, Young-Kyun Kwon, and Won-Jun Lee, Appl. Surf. Sci. 535, 147727 (2021).
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