• Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
  Luchana L. Yusup, Jae-Min Park, Yong-Ho Noh, Sun-Jae Kim, Won-Jun Lee, Sora Park and Young-Kyun Kwon, RSC Adv. 6 (72), 68515-68524 (2016).
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